© Fraunhofer / Piotr Banczerowski
The evolution of microchips seemed to have reached its limits, as far as their size is concerned. Nevertheless, it is crucial that these small components become even smaller and more powerful so that many devices — including smartphones — can be developed even further. The Fraunhofer Institute for Silicon Technology ISIT in Itzehoe and IMS Nanofabrication GmbH have now succeeded in pushing the existing boundaries when it comes to MEMS processing of a microsystem switching element which is at the core of an electron beam mask writer — a crucial piece of equipment in the production of the latest generation of microchips. Their efforts have earned them the 2021 Joseph von Fraunhofer Prize.
MORE INFO
MORE INFO